发明名称 COF SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a COF semiconductor device and its manufacturing method, where a junction between a semiconductor element and a wiring pattern provided on a thin film insulating tape is improved in reliability, and air bubbles and voids occurring in an insulating resin in a sealing process are reduced to make the COF semiconductor device more reliable. <P>SOLUTION: The COF semiconductor device is equipped with a thin film insulating tape 1 where wiring patterns 2 are arranged, the semiconductor element 3, and an insulating resin 7 which fixes the semiconductor element 3 on the wiring patterns 2 as the semiconductor element 3 is electrically connected to the wiring patterns 2. The method of manufacturing the COF semiconductor device comprises a resin applying process of applying the insulating resin 7 on the insulating tape 1, a semiconductor element cold-welding process of cold-welding the semiconductor element 3 on the wiring patterns 2 by applying a pressure from above the insulating resin 7, and a resin curing process of curing the insulating resin 7 to fix the semiconductor element 3 on the wiring patterns 2 as the semiconductor element 3 is electrically connected to the wiring patterns 2 by cold-welding. Moreover, the manufacturing method includes an insulating resin pre-heating process of pre-heating the rear of the insulating tape 1 before the insulating resin 7 is applied. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004128337(A) 申请公布日期 2004.04.22
申请号 JP20020292597 申请日期 2002.10.04
申请人 SHARP CORP 发明人 SEKO TOSHIHARU
分类号 H01L21/56;H01L21/60;H01L23/498;H05K1/18;H05K3/30 主分类号 H01L21/56
代理机构 代理人
主权项
地址