发明名称 MANUFACTURE METHOD FOR FLUORINE-CONTAINING RESIN THIN FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for easily manufacturing a fluorine-containing resin independent thin film which is homogeneous in engineering, un-scratched and un-stretched on a surface and excellent in cleanness as well as transparency, without passing through the process such as a water-steeping separation at separating a film from a substrate. <P>SOLUTION: In the method for manufacturing the fluorine-containing resin thin film by forming a homogeneous fluorine-containing resin film on the substrate and separating the thin film from the substrate, a resin layer not containing a fluorine atom is formed in advance on the substrate as a base layer, then a thin layer is formed by applying the fluorine-containing resin on the surface of the base layer, and finally the independent thin film is produced by separating the formed thin layer from the base layer. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004122792(A) 申请公布日期 2004.04.22
申请号 JP20030406702 申请日期 2003.12.05
申请人 MITSUI CHEMICALS INC 发明人 AGO TOKINORI;MATSUZAKI HITOMI;NAKAYAMA TOKUO
分类号 B29C41/12;B29K27/12;B29L7/00;G03F1/62;H01L21/027;(IPC1-7):B29C41/12;G03F1/14 主分类号 B29C41/12
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