| 摘要 |
PROBLEM TO BE SOLVED: To accurately and rapidly measure a distribution of birefringence of a sample, without being affected by the interferences of both sides of a wafer or being affected by the thickness distribution of the wafer, while considering the conventional technical problems. SOLUTION: In the method, the sample, having two principal surfaces opposite to each other into which light can be projected, is inclined so that the direction normal to the principal surface forms a first tilt angle in relation to the optical axis, and a first transmitted wavefront is measured, in such a state that P polarized light is made to coincide with the first principal axis of the sample to be measured; then the sample is inclined so that the direction normal to the principal surface forms a second tilt angle in relation to the optical axis; and a second transmitted wavefront is measured, in such a state that P polarized light coincides with the first principal axis of the sample to be measured, and thereby measuring the distribution of birefringence of the polarized light along the principal axis. COPYRIGHT: (C)2004,JPO
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