| 摘要 |
PROBLEM TO BE SOLVED: To improve the ionization rate of raw material atoms (molecules) and the uniformity of the ion density distribution in the sectional direction of the raw material atoms (molecules) ion beams in ionization deposition. SOLUTION: Deposited films are formed by making rare gas to a meta-stable excited state and acting the gas on the raw material particles, and by bringing the gas in proximity to a supply point (a supply port) of process gas in the flying space of the raw material particles, or while controlling members (electrodes, deposition preventing plates, etc.) arranged on a substrate side to the surface potential 0≥Vp-V. Vp denotes the maximum plasma potential in the flying space of the raw material atoms (molecules) and V denotes the surface potential of the members. COPYRIGHT: (C)2004,JPO
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