发明名称 |
Method of manufacturing the multi-tip probe, a multi-tip probe, and surface characteristic analysis apparatus |
摘要 |
In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever 1 formed with a plurality of electrodes 3 using lithographic techniques, and forming microscopic electrodes 6 minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever 1 using a focused charged particle beam or using CVD.
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申请公布号 |
US2004074288(A1) |
申请公布日期 |
2004.04.22 |
申请号 |
US20030651526 |
申请日期 |
2003.08.29 |
申请人 |
SHIRAKAWABE YOSHIHARU;TAKASASHI HIROSHI;ARAI TADASHI |
发明人 |
SHIRAKAWABE YOSHIHARU;TAKASASHI HIROSHI;ARAI TADASHI |
分类号 |
G01Q10/04;G01Q20/04;G01Q60/10;G01Q60/16;G01Q60/24;G01Q60/32;G01Q60/38;G01Q70/06;G01R1/073;G01R3/00;H01L21/66;(IPC1-7):G01N13/16;H01L21/64 |
主分类号 |
G01Q10/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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