| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus having a lighting system with a reflective optical element capable of improving control of lighting settings. SOLUTION: In the lighting system using a mirror, the facet of a field facet mirror condenses a plurality of source images on the respective facets of pupil facet mirrors to perform the function of an accumulator. A facet masking means is provided to selectively interrupt the facets of the field or the pupil facet mirror. The facet masking means has a grid which can be selectively inserted into a projected beam and makes an intermediate lighting setting. The grid has an interval which is smaller than the source image and larger than the wavelength of the projected beam, thereby causing no refraction. COPYRIGHT: (C)2004,JPO |
