发明名称 |
Optical antireflection film and process for forming the same |
摘要 |
A first SiO film having a refractive index substantially equal to the refractive index of an acrylic resin substrate is formed to a thickness of about 200 nm on the substrate, and a second SiO film having a refractive index assuming a value falling within the range from 1.48 to 1.62 is formed to a thickness of about 200 nm on the first SiO film. Further, in the case of an HLHL type antireflection film for example, a TiO2 film having a refractive index assuming a value falling within the range from 2.2 to 2.4 is formed as the layer next to the outermost layer with a special ion plating apparatus.
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申请公布号 |
US2004075910(A1) |
申请公布日期 |
2004.04.22 |
申请号 |
US20030644555 |
申请日期 |
2003.08.20 |
申请人 |
SHINMAYWA INDUSTRIES, LTD. |
发明人 |
SHOZUDE ATSUSHI;TOKOMOTO ISAO;HORI TAKANOBU;FURUTSUKA TAKESHI |
分类号 |
C23C14/06;C23C14/08;C23C14/20;C23C14/26;C23C14/30;C23C14/32;G02B1/11;(IPC1-7):G02B5/08;G02B17/00 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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