发明名称 Production apparatus and method of producing a light-emitting device by using the same apparatus
摘要 A production apparatus having a small footprint and a method of producing a light-emitting device by using the production apparatus. The apparatus for producing light-emitting devices, comprises a loading chamber, a chamber for forming a film of a light-emitting material, a chamber for forming a film of an electrically conducting material, a chamber for forming a film of an insulating material and an unloading chamber, wherein the chamber for forming the film of the light-emitting material is the one for forming the film of the light-emitting material by a liquid jet method, the chamber for forming the film of the electrically conducting material is the one for forming the film of the electrically conducting material by a sputtering method, and the chamber for forming the film of the insulating material is the one for forming the film of the insulating material by the sputtering method, and wherein a substrate to be treated is so supported that an angle subtended by the film-forming surface of the substrate to be treated and the direction of gravity is within from 0 to 30° in all of the loading chamber, the chamber for forming the film of the light-emitting material, the chamber for forming the film of the electrically conducting material, the chamber for forming the film of the insulating material and the unloading chamber.
申请公布号 US2004077113(A1) 申请公布日期 2004.04.22
申请号 US20030614565 申请日期 2003.07.07
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;HAMADA TAKASHI;SEO SATOSHI
分类号 H05B33/10;B05C5/00;B05D1/02;B05D3/00;B41J2/01;H01L21/00;H01L31/10;H01L51/00;H01L51/56;(IPC1-7):H01L21/00 主分类号 H05B33/10
代理机构 代理人
主权项
地址