发明名称 |
Apparatus and process for sensing fluoro species in semiconductor processing systems |
摘要 |
A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
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申请公布号 |
US2004074285(A1) |
申请公布日期 |
2004.04.22 |
申请号 |
US20020273036 |
申请日期 |
2002.10.17 |
申请人 |
DIMEO FRANK;CHEN PHILIP S. H.;NEUNER JEFFREY W.;WELCH JAMES;STAWASZ MICHELE;BAUM THOMAS H.;KING MACKENZIE E.;CHEN ING-SHIN;ROEDER JEFFREY F. |
发明人 |
DIMEO FRANK;CHEN PHILIP S. H.;NEUNER JEFFREY W.;WELCH JAMES;STAWASZ MICHELE;BAUM THOMAS H.;KING MACKENZIE E.;CHEN ING-SHIN;ROEDER JEFFREY F. |
分类号 |
G01N33/00;(IPC1-7):G01N27/04;H01L21/66 |
主分类号 |
G01N33/00 |
代理机构 |
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