发明名称 Wafer processing method
摘要 A wafer processing method for use with a wafer processing apparatus having a liquid cooling jacket with a built-in coolant liquid circulation path and a ceramic plate as attached onto the liquid cooling jacket and having therein a heater and an electrode for an electrostatic chuck. The method enables performance of wafer processing while letting a wafer be mounted on the ceramic plate by a wafer transport. The method includes causing the wafer transport to transport the wafer onto the ceramic plate, pre-heating the wafer while the wafer is held on the ceramic plate for a predetermined length of time, and mounting the preheated wafer on the ceramic plate.
申请公布号 US2004076411(A1) 申请公布日期 2004.04.22
申请号 US20030658281 申请日期 2003.09.10
申请人 KANNO SEIICHIRO;YOSHIOKA KEN;NISHIO RYOJI;KANAI SABUROU;KIHARA HIDEKI;OKUDA KOJI 发明人 KANNO SEIICHIRO;YOSHIOKA KEN;NISHIO RYOJI;KANAI SABUROU;KIHARA HIDEKI;OKUDA KOJI
分类号 H01L21/00;H01L21/683;(IPC1-7):F27B5/14 主分类号 H01L21/00
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