发明名称 |
Chemical amplification type positive resist composition |
摘要 |
A chemical amplification type positive resist composition, which can attain high sensitivity while maintaining high resolution, and comprises (A) a compound of the following formula (I): wherein, R<1 >represents a hydrocarbon group optionally having a substituent containing an oxygen atom or nitrogen atom or being optionally substituted by a halogen atom; (B) a resin which itself is insoluble or poorly soluble in an alkaline aqueous solution but becomes soluble in an alkaline aqueous solution by the action of an acid; and (C) a quaternary ammonium salt is provided.
|
申请公布号 |
US2004076902(A1) |
申请公布日期 |
2004.04.22 |
申请号 |
US20020271754 |
申请日期 |
2002.10.17 |
申请人 |
NAKANISHI JUNJI;NAMBA KATSUHIKO |
发明人 |
NAKANISHI JUNJI;NAMBA KATSUHIKO |
分类号 |
C09K3/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
C09K3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|