| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition which is suitable for excimer laser lithography and has excellent sensitivity, resolution and rectangular profile. <P>SOLUTION: The chemically amplified positive resist composition contains a nitrogen-containing compound shown by formula (VIa) or (VIb), a resin soluble into alkali solution by the operation of acid and a specified acid producing agent. In the formula (VIa), (VIb), A is an alicyclic hydrocarbon group, X is an alkylene group or single bond of carbon number 1-4, R<SP>13</SP>, R<SP>15</SP>and R<SP>16</SP>are hydrogen atom, alkyl group of carbon number 1-12 or the like independently one another, R<SP>14</SP>is hydrogen atom, alkyl group or the like of carbon number 1-12 and (n) is an integer of 1-5 respectively. <P>COPYRIGHT: (C)2004,JPO |
