| 摘要 |
PROBLEM TO BE SOLVED: To provide a development processing apparatus and a development processing method in which stable development processing is performed by suppressing the non-uniformity in a flow velocity or the like when feeding a developer onto a substrate including a photoresist film. SOLUTION: The development processing apparatus is provided with a substrate holding means 5 for holding a substrate 2, a nozzle 1 for feeding the developer onto the substrate 2. Further, the apparatus has a plate moving means 41 for disposing a plate 4 close to the substrate 2 so that an upper surface of the plate 4 and an upper surface of the substrate 2 become the same plane, and an interval between the plate 4 and the substrate 2 becomes shorter than or equal to a predetermined interval; and a nozzle moving means for continuously feeding the developer onto the substrate 2 after the nozzle 1 feeds the developer onto the plate while moving along with the upper surfaces of the plate 4 and the substrate 2. COPYRIGHT: (C)2004,JPO |
