METHOD FOR FORMING ETCH MASK USED IN FABRICATING PLANAR LIGHTWAVE GUIDE, ESPECIALLY PREVENTING THE DAMAGE OF AN EPI LAYER LIKE A MASK PATTERN AND A LIGHTWAVE GUIDE

摘要

PURPOSE: A method for forming an etch mask used in fabricating a planar lightwave guide is provided to prevent the damage of an epi layer like a mask pattern and a lightwave guide, and to form a more accurate mask pattern and to increase etch rate of a mask layer. CONSTITUTION: A lightwave guide is formed on a substrate(100). A mask layer is formed on the lightwave guide. A photoresist pattern revealing the mask layer is formed on the mask layer. And a mask pattern(550) is formed by patterning the revealed mask layer with an etching method using an inductively coupled plasma apparatus including a cathode electrode applied with the first RF power and an inductively coupled plasma coil and a chamber, using the photoresist pattern as a mask.