发明名称 Method and apparatus for forming electrolytic water and apparatus for washing semiconductor substrate using electrolytic water-forming apparatus
摘要 In forming an electrolytic water, pure water or ultra-pure water is added to at least one solid supporting electrolyte selected from the group consisting of oxalic acid, ammonium oxalate, ammonium formate, ammonium bicarbonate, and ammonium tartrate to prepare a solution saturated with the supporting electrolyte. The solution containing the supporting electrolyte is subjected to hydrolysis to obtain an anodic water and a cathodic water.
申请公布号 US6723226(B1) 申请公布日期 2004.04.20
申请号 US19960631226 申请日期 1996.04.12
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TAKAYASU JUN;MIYASHITA NAOTO;KAWAGUCHI MIKIKO
分类号 C25B9/00;C02F1/461;C02F1/68;C02F9/00;H01L21/02;(IPC1-7):C02F1/461 主分类号 C25B9/00
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