发明名称 |
Method and apparatus for elimination of high energy ion from EUV radiating device |
摘要 |
A method for the elimination of high-energy ion in an EUV light-radiating device includes irradiating a first target with a first exciting laser to produce a laser-produced plasma EUV light source and causing a high-energy ion generated simultaneously with EUV light to collide against plasma produced by irradiating a second target with a second laser to separate the high-energy ion from the orbit of the EUV light. An apparatus for the elimination of a high-energy ion in an EUV light-radiating device includes a device for irradiating a first target with a first exciting laser to produce a plasma EUV light source and induce emission of EUV light, a device for irradiating a second target with a second laser to produce plasma, and a device for causing a high-energy ion generated simultaneously with the EUV light to be delayed by difference between an ion flight time and plasma expansion time for ion elimination and collide against the plasma to separate the high-energy ion from the orbit of the EUV light.
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申请公布号 |
US6724004(B2) |
申请公布日期 |
2004.04.20 |
申请号 |
US20020279854 |
申请日期 |
2002.10.25 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY |
发明人 |
YASHIRO HIDEHIKO |
分类号 |
G01N23/227;G03F7/20;G21K1/00;G21K5/00;G21K5/02;G21K5/08;H01L21/027;H05G1/00;H05G2/00;(IPC1-7):G01J1/00 |
主分类号 |
G01N23/227 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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