发明名称 PROCESS DETERMINING CONTENTS OF IMPURITIES IN XENON
摘要 FIELD: analysis of materials. SUBSTANCE: characteristic feature of process lies in conducting concentration of impurities in region of high vacuum of mass spectrometer after metering valve by way of partial condensation of xenon at temperature of 77 K. In this case impurities present in xenon and displaying higher values of pressure of saturated vapors and lesser as compared with xenon pressure in flow enter freely ion source of mass spectrometer. EFFECT: markedly raised sensitivity and accuracy of mass spectrometric process of measurements. 3 tbl
申请公布号 RU2227291(C2) 申请公布日期 2004.04.20
申请号 RU20020111318 申请日期 2002.04.25
申请人 发明人 GOLIK V.M.;DZHAVAEV B.G.;ELISTRATOV O.V.
分类号 G01N30/72;B01D59/44 主分类号 G01N30/72
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