Apparatus for calibrating the position of a wafer platform in an ion implanter

摘要

An apparatus and a method for calibrating the position of a wafer platform in an ion implanter, and particularly in a medium current ion implanter. The apparatus is constructed by a curvilinear piece formed in a half-circular shape, a pair of linear rods for supporting the curvilinear piece, and at least one cross-bracing rod connected in-between the pair of linear rods for providing rigidity of the apparatus. When the inside peripheral surface of the curvilinear piece intimately engages an outside peripheral surface of the wafer platform of the ion implanter, or when the first and second linear rods fit snugly on the implanter indicative that the wafer platform is properly calibrated at a zero-angle position. When such fitting is not possible, the wafer platform is then adjusted until a snug fitting is made possible.