发明名称 |
PHOTOMASK ASSEMBLY INCORPORATING A POROUS FRAME AND METHOD FOR MAKING IT |
摘要 |
A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm<2>.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/°C and 10 ppm/°C. |
申请公布号 |
WO2004031856(A2) |
申请公布日期 |
2004.04.15 |
申请号 |
WO2003US31912 |
申请日期 |
2003.09.30 |
申请人 |
YAZAKI CORPORATION;GANGULI, RAHUL;ROBINSON, TROY;MEIXNER, D., LAURENCE |
发明人 |
GANGULI, RAHUL;ROBINSON, TROY;MEIXNER, D., LAURENCE |
分类号 |
A47G1/12;B44F1/00;C03B37/016;G03F;G03F1/64;G03F9/00 |
主分类号 |
A47G1/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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