| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a novel chamfering method in which monitoring of the extent of abrasion of a chamfering whetstone is not required and troublesomeness of production management is lessened. <P>SOLUTION: In the chamfering method of a permanent magnet, a part of the permanent magnet to be chamfered is irradiated with a laser beam, or at least a part to be chamfered at the outer or inner circumferential edge of an arcuate sintered magnet is irradiated with a laser beam. High accuracy and efficiency of chamfering work can be ensured without monitoring the extent of abrasion of a chamfering whetstone. <P>COPYRIGHT: (C)2004,JPO</p> |
