发明名称 METHOD OF FORMING RESIST PATTERN, METHOD OF FORMING ELECTRODE PATTERN, AND SURFACE ACOUSTIC WAVE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of forming a resist pattern and a method of forming an electrode pattern for obtaining an electrode pattern with high quality and high reliability by forming, on a piezoelectric substrate, the resist pattern of an inversely tapered shape which has excellent exfoliation performance and does not cause resist falling. <P>SOLUTION: When the resist pattern is formed on the piezoelectric substrate, the substrate is exposed and developed after a reflection control film to control a reflected light quantity is formed on the rear side of the piezoelectric substrate. In this case, the reflection control film has a refractive index to satisfy a relation of 0.04<r2<0.08, wherein r2 is the reflectance of a substrate rear side/reflection control film boundary face at which the resist pattern is obtained with an ideal inversely tapered cross section. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004120132(A) 申请公布日期 2004.04.15
申请号 JP20020278087 申请日期 2002.09.24
申请人 MURATA MFG CO LTD 发明人 FUYUTSUME TOSHIYUKI;KOSHIDO YOSHIHIRO;SAKAGUCHI KENJI;NAKANISHI HIDEFUMI
分类号 G03F7/004;H03H3/08 主分类号 G03F7/004
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