发明名称 MULTILAYER PEDESTAL FOR VERTICAL FURNACE
摘要 PROBLEM TO BE SOLVED: To provide a heat insulating wafer-boat support pedestal which is not bulky and capable of being used at ultra-high temperatures in a vertical furnace, for example, at 1,000°C or higher. SOLUTION: The pedestal 100 for use in a high-temperature vertical furnace for processing semiconductor wafers is provided with a closure and heat insulating materials for the lower end of the furnace, and is a wafer boat support. The pedestal 100 comprising quartz-enveloped heat insulating materials (130, 132), supports a wafer boat at a boat support level 113, and is provided with an upper section 102 disposed above the boat support level 113. The upper section 102 comprises an enveloped heat insulating material 130. The envelope of the upper section 102 is also formed of quartz, and the insulating material 130 in the upper section 102 has thermal conductivity lower than that of the insulating material 132 in a lower quartz-enveloped section 104. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004119957(A) 申请公布日期 2004.04.15
申请号 JP20030071685 申请日期 2003.03.17
申请人 ASM INTERNATL NV 发明人 OOSTERLAKEN THEODORUS GERARDUS MARIA;HUUSEN FRANK;LANDSMEER TIMOTHY ROBERT;TERHORST HERBERT
分类号 F27D3/12;H01L21/00;H01L21/22;H01L21/683;(IPC1-7):H01L21/22;H01L21/68 主分类号 F27D3/12
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