| 摘要 |
PROBLEM TO BE SOLVED: To provide a CVD film manufacturing method and a CVD film manufacturing apparatus for depositing a thin film of uniform refractive index and film thickness without degrading the film deposition rate and the yield. SOLUTION: In the CVD film manufacturing method and the CVD film manufacturing apparatus, an upper electrode 3 and a lower electrode 4 are disposed facing each other at a predetermined interval in a closed reaction chamber 2, substrates 6a-6c are held on the lower electrode 4, the reaction chamber 2 is evacuated, high frequency voltage is applied between the electrodes 3 and 4 to generate plasma, the electrodes 3 and 4 are heated to a desired temperature, raw material gas of the thin film is fed to a shower plate 12 integrated with the upper electrode 3 through a through hole formed in the upper electrode 3, and blown over the entire upper surfaces of the substrates 6a-6c through the shower plate 12, a gas diffuser 14 is provided between the through hole in the upper electrode 3 and the shower plate 12, and the gas passing through the through hole is guided to the surface direction of the shower plate 12 by the gas diffuser 14. COPYRIGHT: (C)2004,JPO
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