| 发明名称 |
Cluster tool for E-beam treated films |
| 摘要 |
One embodiment of the present invention is a cluster tool for processing wafers that includes: (a) one or more chemical vapor deposition chambers; (b) one or more e-beam treatment chambers; and (c) a transfer chamber adapted to transfer a wafer from one chamber to another while maintaining vacuum conditions.
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| 申请公布号 |
US2004069410(A1) |
申请公布日期 |
2004.04.15 |
| 申请号 |
US20030655276 |
申请日期 |
2003.09.03 |
| 申请人 |
|
发明人 |
MOGHADAM FARHAD;ZHAO JUN;WEIDMAN TIMOTHY;ROBERTS RICK J.;XIA LI-QUN;DEMOS ALEXANDROS T. |
| 分类号 |
B05D3/06;B05D7/24;C23C16/26;C23C16/40;C23C16/56;H01L21/3105;H01L21/312;(IPC1-7):H01L21/306 |
主分类号 |
B05D3/06 |
| 代理机构 |
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代理人 |
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