发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION AND OPTICAL WAVEGUIDE
摘要 <p>A photosensitive resin composition for optical waveguide formation which comprises the following ingredients (A), (B), and (C) as components. This composition is excellent in suitability for patterning, refractive index, heat resistance, transmission characteristic, etc. (A) A di(meth)acrylate having a structure represented by the following general formula (1): (1) (wherein R&lt;1&gt; represents -(OCH2CH2)m-, etc.; X represents -C(CH3)2-, etc.; Y represents hydrogen or halogeno; and m is an integer of 0 to 4); (B) a mono(meth)acrylate having a structure represented by the following general formula (2): (2) (wherein R&lt;2&gt; represents -(OCH2CH2)p-, etc.; Y represents hydrogen, halogeno, Ph, etc.; and p is an integer of 0 to 4; provided that Ph represents phenyl); and (C) a free-radical photopolymerization initiator.</p>
申请公布号 WO2004031251(A1) 申请公布日期 2004.04.15
申请号 WO2003JP12479 申请日期 2003.09.30
申请人 JSR CORPORATION;TAKASE, HIDEAKI;ERIYAMA, YUUICHI 发明人 TAKASE, HIDEAKI;ERIYAMA, YUUICHI
分类号 C08F222/10;C08F220/10;G02B6/12;G02B6/122;G02B6/13;G02B6/138;(IPC1-7):C08F220/10 主分类号 C08F222/10
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