发明名称 POLISHING DEVICE AND PLANARIZING METHOD OF INTERLAYER DIELECTRIC
摘要 <P>PROBLEM TO BE SOLVED: To improve detecting precision of the end point of an interlayer dielectric. <P>SOLUTION: A reflection-preventing film 4 is formed flatly on the interlayer dielectric 3, and the end point of the interlayer dielectric 3 is detected by monitoring reflected light intensity from the interlayer dielectric 3 while polishing the interlayer dielectric 3. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004119596(A) 申请公布日期 2004.04.15
申请号 JP20020279283 申请日期 2002.09.25
申请人 SEIKO EPSON CORP 发明人 IKEDA KOJI
分类号 B24B49/12;B24B37/013;H01L21/304;H01L21/768;H01L23/522 主分类号 B24B49/12
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