发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN, AND ELECTRONIC COMPONENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition containing a heat resistant resin having photosensitivity, a method for manufacturing patterns using the same, and electronic components. <P>SOLUTION: The positive photosensitive resin composition contains (A) a polymeric compound having at least one phenolic hydroxyl group or carboxyl group in the molecule, (B) a compound generating an acid by irradiation with active rays, and (C) a compound having an organic group convertible to carboxylic acid by an acid catalyst effect, and has excellent sensitivity and resolution. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004117709(A) 申请公布日期 2004.04.15
申请号 JP20020279522 申请日期 2002.09.25
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD 发明人 MINEGISHI TOMONORI
分类号 G03F7/039;G03F7/037;H01L21/027 主分类号 G03F7/039
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