| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry etching system for preventing production of contaminations produced at elevation / descending of a focus ring. SOLUTION: A tip shape of an arm 9 of the focus ring 8 is downward convexed, and a shape of a support 10 is upward concaved. In etching, the focus ring 8 rises up to an etching position together with an ESC stage 3 while being floated from the support 10 to ensure a stable plasma region. When the etching is finished, the focus ring 8 is descended with the ESC stage 3 and fixed by a projection 9a of the tip of the arm 9 of the focus ring 8, which is contained in a recess 10a of the support 10. COPYRIGHT: (C)2004,JPO
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