SILICON ANISOTROPIC ETCHING LIQUID AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide silicon anisotropic etching liquid for selectively etching only silicon without etching aluminum. SOLUTION: A problem is solved with anisotropic etching solution where silicon is dissolved into 3.0 to 20.0 mass % of TMAH water solution so that it becomes 0.9 to 8.0 mass % and oxidant is added or silicon anisotropic etching solution comprising 3.0 to 20.0 mass % of TMAH, silicon and ammonium nitrate. COPYRIGHT: (C)2004,JPO