发明名称 |
A METHOD FOR PHOTOLITHOGRAPHY USING MULTIPLE ILLUMINATIONS AND A SINGLE FINE FEATURE MASK |
摘要 |
A method forms a feature pattern on a substrate by exposing the substrate (726 of Figure 17), using a mask (722 of Figure 17) having a pattern of features (832 of Figure 17) thereon, with illumination having a first set of settings (23 of Figure 17). The substrate is exposed a second time, using the same mask having the pattern of features thereon, with illumination having a second set of settings (723 of Figure 17). The mask having the pattern of features thereon remains stationary between the two illumination exposures of the substrate. |
申请公布号 |
WO03102696(A3) |
申请公布日期 |
2004.04.15 |
申请号 |
WO2003US16862 |
申请日期 |
2003.05.29 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
FRITZE, MICHAEL;TYRELL, BRIAN, M. |
分类号 |
G03B27/48 |
主分类号 |
G03B27/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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