发明名称 |
Plasma coating, etching or treatment of concave surfaces in vacuum, directs electron beam from arc source along magnetic field lines into cavity of substrate |
摘要 |
A low voltage electron beam from an arc discharge source (2), is led along magnetic field lines (8), into the substrate cavity. Further beams operating on the same principle may be employed. An Independent claim is included for corresponding equipment.
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申请公布号 |
DE10246181(A1) |
申请公布日期 |
2004.04.15 |
申请号 |
DE20021046181 |
申请日期 |
2002.10.02 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
MORGNER, HENRY;NEUMANN, MANFRED |
分类号 |
C23C14/04;C23C14/32;(IPC1-7):H01J37/305;C23C14/12;C23C14/24;C23F4/00;H01J37/32 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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