| 摘要 |
PROBLEM TO BE SOLVED: To reduce the influence of a temperature fluctuation of a substrate with respect to an external temperature fluctuation of a reaction chamber and to assure the uniformity of the film thicknesses of substrates between batches and to improve quality by measuring an environmental temperature and performing the temperature control corresponding to the fluctuation in the environmental temperature. SOLUTION: At the outside of the reaction chamber 10, a thermocouple 42 for measuring the environmental temperature capable of measuring the peripheral temperature thereof is provided and a target temperature is corrected on the basis of the measured temperature of the thermocouple 42. Feedback control is then performed in such a manner that the deviation between the corrected target temperature and the measured value of a plate heater 16 or the measured temperature of a susceptor for holding the substrate is made to be zero. COPYRIGHT: (C)2004,JPO
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