发明名称 METHOD AND SYSTEM FOR ANALYZING DATA FROM A PLASMA PROCESS
摘要 A method and system for analyzing multivariate data of plasma processes in which response surface and neural networks are utilized to improve or find optimal process settings of the plasma process such that performance measurements are compared against model measurements to modify a current plasma process to achieve optimized processing performance.
申请公布号 WO2004032194(A2) 申请公布日期 2004.04.15
申请号 WO2003US30741 申请日期 2003.09.30
申请人 TOKYO ELECTRON LIMITED;DELP, DEANA;CHEN, LEE 发明人 DELP, DEANA;CHEN, LEE
分类号 C23F1/00;H01J37/32 主分类号 C23F1/00
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