| 摘要 |
PROBLEM TO BE SOLVED: To evade troubles in valve mechanism, valveless mechanism, etc. and perform quickly change of two or more kinds of reactant gasses. SOLUTION: A substrate processor is provided with a treatment room 20 for treating a wafer 20, a material gas charging line 21 whose one end is connected with the room 20, a vaporizer 22 which is connected with the other end of the line 21 and evaporates the liquid material, and a liquid material control unit 23 for controlling the amount of supply of liquid material to be supplied to the the vaporizer 22. The control unit 23 is constituted of a screw feeder 50 or a dispenser 70 which spout liquid material to the vaporizer 22. COPYRIGHT: (C)2004,JPO
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