| 摘要 |
PROBLEM TO BE SOLVED: To realize a substrate processing system in which the number of steps of surface treatment can be increased easily. SOLUTION: In the substrate processing system where a load lock unit 30 and a process unit 50 are coupled around a vacuum conveyor 40, a batch processing unit 60 for processing a plurality of substrates simultaneously is attached to or built in the load lock unit 30. Consequently, the type of process can be increased without increasing the number of coupling chambers of the vacuum conveyor. Throughput is also enhanced. In addition, drying capacity is enhanced by producing high vacuum in the load lock unit 30 and performing heating in the batch processing unit. Furthermore, a conveying mechanism 28 becomes a semibatch mechanism by transferring a substrate shape measuring unit to a process unit 70. COPYRIGHT: (C)2004,JPO |
