发明名称 |
Electron beam pattern generator with photocathode comprising low work function cesium halide |
摘要 |
An electron beam pattern generator comprises a laser beam generator to generate a laser beam. A photocathode receives the laser beam and generates one or more electron beams. The photocathode comprises cesium halide material, such as for example, cesium bromide or iodide. The cesium halide material may have a decreased workfunction that allows efficient operation at a wavelength of the laser beam of at least about 200 nm. Electron optics are provided to focus the electron beams onto a substrate that is supported on a substrate support.
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申请公布号 |
US2004069960(A1) |
申请公布日期 |
2004.04.15 |
申请号 |
US20020282324 |
申请日期 |
2002.10.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MALDONADO JUAN RAMON;COYLE STEVEN T. |
分类号 |
H01J37/073;H01J37/317;(IPC1-7):H01J37/317 |
主分类号 |
H01J37/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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