| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problems wherein: the size of a device has to be very large and and the weight of the device has to be heavy; working efficiency becomes bad in a small quartz crystal plate and in addition; a small amount of convex working is difficult, in a method with low productivity for working quartz crystal plates by one to ten plates at a time, and also in a method for placing a large quantity of quartz crystal plates into a cylindrical polishing vessel and performing convex working. <P>SOLUTION: This convex working method of the quartz crystal plate is provided with processes for: applying photoresist films onto the principal planes of the quartz crystal plate, a process for performing exposure from the center of the quartz crystal plate to its edge side parts from the photoresist films by varying exposure strength to form convex unsensitized parts in the photoresist films; developing a sensitized part of the photoresist films to form photoresist films having a convex surface on the quartz crystal plate; and etching the quartz crystal plate with the photoresist films having the convex surfaces formed on the principal planes to work the shape of the quartz crystal principal planes into a shape similar to a convex shape. <P>COPYRIGHT: (C)2004,JPO |
