| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin precursor composition which can be developed with an alkali. <P>SOLUTION: The positive photosensitive resin precursor composition contains (a) a polymer having a structural unit expressed by general formula (1) as the main component and (b) a quinonediazide compound expressed by general formula (2). In formula (1), each of R<SP>1</SP>and R<SP>2</SP>represents a C2 or more organic group having the valence from two to eight, each of R<SP>3</SP>and R<SP>4</SP>represents a hydrogen atom or a C1-20 organic group, and p and q satisfy p+q>0. In formula (2), each of R<SP>5</SP>and R<SP>6</SP>represents a hydrogen atom or a C1-8 alkyl group, each of R<SP>7</SP>and R<SP>8</SP>represents a hydrogen atom or a C1-8 alkyl group, alkoxyl group, carboxyl groups or ester group, and each of a and b represents an integer from 0 to 4. <P>COPYRIGHT: (C)2004,JPO |
