| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin for a photoresist reduced in contamination of a production line by sublimated material in a photoresist resin and capable of improving productivity thereby, a resin composition for photoresists and a photoresist using the resin composition. <P>SOLUTION: The resin for the photoresist is obtained by reacting phenols with aldehydes in the presence of an acidic catalyst. The phenols contain ortho-cresol as an essential component. The resin composition for the photoresist comprises the resin for the photoresist, a photosensitizer and a solvent. The photoresist comprises the resin for the photoresist and the photosensitizer. <P>COPYRIGHT: (C)2004,JPO |
