发明名称 CIRCUIT SIMULATION DEVICE INTEGRATED WITH DIFFUSED LAYER LENGTH DEPENDENCY OF TRANSISTOR AND TRANSISTOR MODEL CREATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a circuit simulation device and a model creation method capable of quickly and easily creating the models of MOS transistors whose diffused layer length is different. SOLUTION: A diffused layer dependency parameter correcting means 4 creates the diffused layer length dependent approximate formula of parameters from a transistor model 2 of an MOS transistor and the data of diffused layer length dependency parameters extracted from various diffused layer length transistors, and calculates the correction value of a parameter to be replaced with the value of the original parameter by using the created approximate formula. Thus, it is possible to easily replace the correction value with the value of the original parameter, and to create the transistor models of MOS transistors whose diffused layer length DL is different. Thus, it is possible to realize circuit simulation under the consideration of the diffused layer length dependency of the drain currents of the MOS transistors, and to realize highly precise simulation. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004119608(A) 申请公布日期 2004.04.15
申请号 JP20020279398 申请日期 2002.09.25
申请人 NEC ELECTRONICS CORP 发明人 SHIMIZU TAKU;SAKAMOTO HIRONORI
分类号 G06F17/50;H01L21/336;H01L21/8234;H01L27/088;H01L29/00;H01L29/78;(IPC1-7):H01L21/823 主分类号 G06F17/50
代理机构 代理人
主权项
地址