发明名称 METHOD FOR MANUFACTURING POLYMER MICROSTRUCTURES AND POLYMER WAVEGUIDES
摘要 <p>A microfabrication process for preparing articles such as optical waveguides in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.</p>
申请公布号 WO2004031863(A1) 申请公布日期 2004.04.15
申请号 WO2003US30663 申请日期 2003.09.29
申请人 LUMERA CORPORATION;DINU, RALUCA;KRESSBACH, JEFFREY, K.;BINTZ, LOUIS, J. 发明人 DINU, RALUCA;KRESSBACH, JEFFREY, K.;BINTZ, LOUIS, J.
分类号 G02B6/12;G02B6/136;G02B6/138;G02F1/065;(IPC1-7):G03F7/09;G02B6/18 主分类号 G02B6/12
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