发明名称 Micropattern forming material and fine structure forming method
摘要 A micropattern forming material comprising a water-soluble component, water and/or an organic solvent miscible with water is used. The water-soluble component is made of at least one selected from the group water-soluble monomers, water-soluble oligomers, copolymers of water-soluble monomers and salts thereof, having a functional group reactable with a carboxyl group. The micropattern forming material is formed on a resist pattern 4 capable of supplying an acid, and a film 6 insoluble in water or an alkali is formed through crosslinking reaction of the water-soluble component at a portion in contact with the resist pattern 4 by the action of the acid from the resist pattern.
申请公布号 US2004072096(A1) 申请公布日期 2004.04.15
申请号 US20030641392 申请日期 2003.08.15
申请人 RENESAS TECH CORP 发明人 TERAI MAMORU;TOYOSHIMA TOSHIYUKI;ISHIBASHI TAKEO;TARUTANI SHINJI
分类号 G03F7/20;G03F7/40;H01L21/312;(IPC1-7):G03F7/004 主分类号 G03F7/20
代理机构 代理人
主权项
地址