发明名称 GaN single crystal substrate and method of making the same
摘要 The method of making a GaN single crystal substrate comprises a mask layer forming step of forming on a GaAs substrate 2 a mask layer 8 having a plurality of opening windows 10 disposed separate from each other; and an epitaxial layer growing step of growing on the mask layer 8 an epitaxial layer 12 made of GaN.
申请公布号 US2004072410(A1) 申请公布日期 2004.04.15
申请号 US20030691569 申请日期 2003.10.24
申请人 MOTOKI KENSAKU;OKAHISA TAKUJI;MATSUMOTO NAOKI 发明人 MOTOKI KENSAKU;OKAHISA TAKUJI;MATSUMOTO NAOKI
分类号 C30B25/02;H01L21/20;H01L33/00;H01S5/02;H01S5/323;(IPC1-7):C30B1/00 主分类号 C30B25/02
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