发明名称 |
CONTACT STRUCTURE OF LOWER ELECTRODE AND FORMING METHOD THEREOF |
摘要 |
PURPOSE: A contact structure of a lower electrode and a method for forming the same are provided to be capable of enhancing the contact area of the lower electrode and a lower layer. CONSTITUTION: A contact plug(180a) is electrically connected to an active region of a semiconductor substrate(100) through an insulating layer(120a). A protrudent supporting layer(260b) is formed on the contact plug, wherein the protrudent height of the supporting layer(260b) is higher than that of the insulating layer. A lower electrode(280a) of a capacitor is formed on the resultant structure. |
申请公布号 |
KR20040031860(A) |
申请公布日期 |
2004.04.14 |
申请号 |
KR20020060465 |
申请日期 |
2002.10.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, JEONG JU |
分类号 |
H01L27/04;H01L21/02;H01L21/768 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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