发明名称 CONTACT STRUCTURE OF LOWER ELECTRODE AND FORMING METHOD THEREOF
摘要 PURPOSE: A contact structure of a lower electrode and a method for forming the same are provided to be capable of enhancing the contact area of the lower electrode and a lower layer. CONSTITUTION: A contact plug(180a) is electrically connected to an active region of a semiconductor substrate(100) through an insulating layer(120a). A protrudent supporting layer(260b) is formed on the contact plug, wherein the protrudent height of the supporting layer(260b) is higher than that of the insulating layer. A lower electrode(280a) of a capacitor is formed on the resultant structure.
申请公布号 KR20040031860(A) 申请公布日期 2004.04.14
申请号 KR20020060465 申请日期 2002.10.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, JEONG JU
分类号 H01L27/04;H01L21/02;H01L21/768 主分类号 H01L27/04
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