| 摘要 |
PURPOSE: Wet etching equipment is provided to be capable of preventing a thin film from being damaged or etched due to mixed chemicals. CONSTITUTION: A wet etching equipment is provided with a wet etching chamber(100), a chemical supply unit, and a chemical circulation unit(300). At this time, the chemical supply unit includes a plurality of chemical storing tanks(210,220), chemical supply lines(215,225) for connecting the chemical storing tanks with the wet etching chamber, and chemical supply valves(213,223) connected to each chemical supply line. At the time, the chemical circulation unit includes chemical circulation lines(320,330) installed at the wet etching chamber for circulating chemicals through different circulation paths according to the kinds of the chemicals and chemical circulation valves(350,360) installed at the chemical circulation lines. The wet etching equipment further includes a valve control unit(400) for controlling the chemical circulation valves and chemical filters(510,520) installed on the chemical circulation lines for filtering the chemicals.
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