发明名称 Polycrystalline silicon thin film for a thin film transistor and display device using the same
摘要 A polycrystalline silicon thin film for a TFT and a display device using the same where the number of crystal grain boundaries exerts a fatal influence on movement of electric charge carrier, providing a distance "S" between active channels of the TFT having dual or multiple channels with a relation S=mGs.sec theta-L, and also providing a display device in which uniformity of TFT characteristics is improved by synchronizing the number of the crystal grain boundaries included in each of the channels of the dual or multiple channelsGs is a size of crystal grains of the polycrystalline silicon thin film, m is an integer of 1 or more, theta is an inclined angle where fatal crystal grain boundaries, that is, "primary" crystal grain boundaries are inclined in a direction perpendicular to an active channel direction, and L represents a length of active channels for each TFT having dual or multiple channels.
申请公布号 US6720578(B2) 申请公布日期 2004.04.13
申请号 US20020298571 申请日期 2002.11.19
申请人 SAMSUNG SDI CO., LTD. 发明人 LEE KI-YONG
分类号 G02F1/1368;G09F9/30;H01L21/20;H01L21/336;H01L21/77;H01L29/04;H01L29/786;(IPC1-7):H01L29/04;H01L29/76 主分类号 G02F1/1368
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