发明名称 Lid assembly for opening a process chamber lid and uses therefor
摘要 Provided herein is a lid assembly for chemical vapor deposition (CVD) process chamber, comprising a moveable lid, two linear guide rollers connected to the lid, one or more linear lifting actuators, and a rotation actuator connected to the axis of the lid. This lid assembly may be used for opening/closing process chamber as well as wet-cleaning process chamber in chemical vapor deposition.
申请公布号 US6719851(B1) 申请公布日期 2004.04.13
申请号 US20000671504 申请日期 2000.09.26
申请人 APPLIED MATERIALS, INC. 发明人 KURITA SHINICHI;BLONIGAN WENDELL T.
分类号 C23C16/44;H01L21/205;H01L21/687;(IPC1-7):B08B9/00;C23C16/00 主分类号 C23C16/44
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