| 摘要 |
PURPOSE: A method and apparatus for removing photoresist are provided to be capable of completely removing the photoresist and reducing the time used for removing the photoresist. CONSTITUTION: Photoresist is stripped by the ashing process which uses an electromagnet(350) to enhance plasma down flow. Preferably, positive type electromagnets and negative type electromagnets are alternately arrayed for forming the electromagnet part. Preferably, vortex type magnetic field is generated from the electromagnet part. Preferably, the plasma down flow is carried out by using high frequency or microwave. Preferably, the electromagnets are sequentially arrayed.
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