PHOTORESIST PURGE CONTROL APPARATUS OF SEMICONDUCTOR COATING EQUIPMENT

摘要

PURPOSE: A photoresist purge control apparatus of a semiconductor coating apparatus is provided to be capable of automatically purging a photoresist solution in pressing a start button. CONSTITUTION: A photoresist purge control apparatus of a semiconductor coating apparatus is provided with a plurality of photoresist bottles(50,52), a plurality of supply pipes(54,56) connected to the upper portion of each photoresist bottle, an air valve(62) for selectively switching the supply pipes, a dispense pump(66) for jetting a photoresist solution by using pressure force, and a nozzle(70) prolonged from the dispense pump. The photoresist purge control apparatus further includes a purge start button(78) for generating a purge start order signal, a timer(76) for counting the first and second setting time, and a controller(74) for automatically purging the photoresist solution.