发明名称 Semiconductor dynamic quantity detecting sensor and manufacturing method of the same
摘要 A semiconductor dynamic quantity sensor, for example, an acceleration sensor is formed on a SOI substrate having an activation layer and a supporting layer with an oxide film interposed therebetween. A structure for the sensor is formed in the activation layer. An opening is formed in the supporting layer and the oxide film to expose the structure. In this sensor, stress layer is formed in the activation layer at a side contacting the oxide film. The stress layer is removed at a region facing the opening to prevent the structure from cambering.
申请公布号 US6718824(B2) 申请公布日期 2004.04.13
申请号 US20010013508 申请日期 2001.12.13
申请人 NIPPON SOKEN, INC.;DENSO CORPORATION 发明人 ITO TAKESHI;ASAMI KAZUSHI;FUKADA TSUYOSHI;HIGUCHI HIROFUMI
分类号 G01P9/04;B81B3/00;G01C19/56;G01L9/00;G01L9/04;G01P15/08;G01P15/125;H01L29/84;(IPC1-7):G01P15/00;H01L21/00 主分类号 G01P9/04
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